Data of "Development and Characterization of a Chemically Amplified Positive-Tone Hybrid Resist for Thick-Film Microfabrication"

DOI

These data meet all results and figures contained in the paper "Development and Characterization of a Chemically Amplified Positive-Tone Hybrid Resist for Thick-Film Microfabrication"

Identifier
DOI https://doi.org/10.57745/BPUVOK
Metadata Access https://entrepot.recherche.data.gouv.fr/oai?verb=GetRecord&metadataPrefix=oai_datacite&identifier=doi:10.57745/BPUVOK
Provenance
Creator ETIENNE, Pascal ORCID logo
Publisher Recherche Data Gouv
Contributor ETIENNE, Pascal; Université de Montpellier; Entrepôt Recherche Data Gouv
Publication Year 2026
Funding Reference Région Occitanie et Université de Montpellier
Rights etalab 2.0; info:eu-repo/semantics/openAccess; https://spdx.org/licenses/etalab-2.0.html
OpenAccess true
Contact ETIENNE, Pascal (L2C)
Representation
Resource Type Dataset
Format text/tab-separated-values; text/plain
Size 7073; 711
Version 1.0
Discipline Chemistry; Physics