In art restoration removal of the old vanish is one of the treatments which presents the hughest risk of deterioration of the pictorial layer because often the solvents penetrate into the deepers layers and weaken its surface and essential elements can then be extracted. Gel-based solutions have been proposed by Piero Baglioni and his team to limit the diffusion of the solvent but it lacks some essential elements for this treatment to be completely innocuous. The purpose of this experiment is to understand the basic polymer physics that underlies these processes.We aim to extend our understanding of the restoration process by investigating the nanoscopic mechanisms of solvent diffusion from aqueous gels to the ultra-thin varnish films and the structural changes of these thin films under shear force via in situ rheo-NR to simulate the abrasion process directly.