Influence of the hBN dielectric layers on the quantum transport properties of MoS2 transistors.

DOI

An ab initio study of the coupled electrons and phonon transport properties of MoS2-hBN devices. A comparison of the device characteristics when hBN is treated as a perfectly insulating, non vibrating layer and one where it is included in the DFT together with MoS2.

Identifier
DOI https://doi.org/10.24435/materialscloud:7f-5t
Related Identifier https://doi.org/10.3390/ma15031062
Related Identifier https://archive.materialscloud.org/communities/mcarchive
Related Identifier https://doi.org/10.24435/materialscloud:bv-18
Metadata Access https://archive.materialscloud.org/oai2d?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai:materialscloud.org:1160
Provenance
Creator Fiore, Sara; Luisier, Mathieu; Ducry, Fabian; Klinkert, Cedric; Backman, Jonathan
Publisher Materials Cloud
Contributor Fiore, Sara; Luisier, Mathieu; Ducry, Fabian; Klinkert, Cedric; Backman, Jonathan
Publication Year 2021
Rights info:eu-repo/semantics/openAccess; Creative Commons Attribution 4.0 International; https://creativecommons.org/licenses/by/4.0/legalcode
OpenAccess true
Contact archive(at)materialscloud.org
Representation
Language English
Resource Type info:eu-repo/semantics/other
Format text/markdown; application/zip
Discipline Materials Science and Engineering